MULTILAYER REFLECTIVE FILM FORMED SUBSTRATE, REFLECTIVE MASK BLANK, MASK BLANK, METHODS OF MANUFACTURING THE SAME, REFLECTIVE MASK, AND MASK

摘要

Provided is a multilayer reflective film formed substrate formed with a fiducial mark for accurately managing coordinates of defects. A multilayer reflective film formed substrate is formed with a multilayer reflective film, which is adapted to reflect EUV light, on a substrate and a fiducial mark which serves as a reference for a defect position in defect information is formed on the multilayer reflective film. The fiducial mark includes a main mark for determining a reference point for the defect position and auxiliary marks arranged around the main mark. The main mark has a point-symmetrical shape and has a portion with a width of 200 nm or more and 10 μm or less with respect to a scanning direction of an electron beam writing apparatus or defect inspection light.

主权项

1. A method of manufacturing a multilayer reflective film formed substrate, the multilayer reflective film formed substrate comprising a substrate and a multilayer reflective film which is formed on the substrate and which reflects EUV light, the method comprising:
forming a fiducial mark which serves as a reference for a defect position in defect information; specifying, after forming the fiducial mark, a formation position of the fiducial mark by a coordinate measuring apparatus; and correlating the multilayer reflective film formed substrate comprising the fiducial mark and formation position information of the fiducial mark with each other.