DEPOSITION APPARATUS

摘要

A deposition apparatus includes a vacuum chamber, a substrate disposed in the vacuum chamber, a deposition source disposed in the vacuum chamber and facing the substrate to provide a deposition material onto the substrate, a laser oscillator generating a first laser beam, and an optical unit connected to a first side of the vacuum chamber and splitting the first laser beam to generate a plurality of mask laser beams. The mask laser beams are irradiated into the vacuum chamber to be disposed between the substrate and the deposition source. The deposition material making contact with the mask laser beams is oxidized, and the deposition material passing through the mask laser beams is deposited on the substrate.

主权项

1. A method of depositing a deposition material onto a substrate, comprising:
disposing a substrate in a vacuum chamber, the substrate including a plurality of opening portions arranged in columns and defined by a pixel defining layer; generating a first laser beam using a laser oscillator; splitting the first laser beam using an optical unit connected to the vacuum chamber to generate a plurality of mask laser beams; providing the deposition material of a deposition source; and irradiating the mask laser beams into the vacuum chamber onto the deposition material, such that the deposition material making contact with the mask laser beams is oxidized, an area between mask laser beams adjacent to each other overlaps with opening portions arranged in a corresponding column of the columns, and the deposition material passing through between the mask laser beams is deposited on the substrate.