DRESSING APPARATUS AND DRESSING METHOD OF POLISHING PAD OF DOUBLE-SIDE POLISHING APPARATUS

摘要

To provide a dressing apparatus capable of uniformly dressing a polishing pad. The apparatus includes first and second dressing grind stones 51 and 52 which grind polishing pads 17 and 18 by moving in a radial direction of upper and lower polishing plates 12 and 14 while abutting on corresponding polishing pads 17 and 18, in which the first and second dressing grind stones 51 and 52 are set so as to have: an inner side region portion P; an outer side region portion Q; and an intermediate region portion R, wherein the length of each of the inner side region portion P and the outer side region portion Q extending in a circumferential direction of the polishing plates 12 and 14 is longer than the length of the intermediate region portion R extending in a circumferential direction of the polishing plates.

主权项

1. A dressing apparatus of a polishing pad of a double-side polishing apparatus for dressing both polishing pads of upper and lower polishing plates,
in the double-side polishing apparatus including: the ring-shaped lower polishing plate having the polishing pad fixed on an upper surface and being provided rotatably centering on a rotary shaft; the ring-shaped upper polishing plate having the polishing pad fixed on a lower surface and being provided vertically movably above the lower polishing plate and rotatably centering on a rotary shaft; a sun gear disposed at a center of the lower polishing plate; an internal gear disposed while surrounding the lower polishing plate; a carrier that is disposed between the lower polishing plate and the upper polishing plate, has a through-hole for holding a work and revolves around the sun gear and rotates on its axis while meshing with the sun gear and the internal gear; and a slurry supply mechanism for supplying slurry to the polishing pad, the dressing apparatus comprising: an arm member provided so as to enter between the upper and lower polishing plates and be capable of going straight or swinging in an arc shape centering on a rotary shaft; a supporting member provided at a tip part of the arm member; first and second dressing grind stones which are provided on the upper surface side and the lower surface side of the supporting member, respectively, and which move in a radial direction of the upper and lower polishing plates while abutting on the corresponding polishing pad surfaces as a result of the fact that the arm member goes straight or swings in an arc shape as described above, to thereby grind the corresponding polishing pads, wherein each of the first and second dressing grind stones has: an inner side region portion which is positioned on an inner edge side of the upper and lower polishing plates when moving in an inner edge direction of the upper and lower polishing plates and which extends by a required length in a radial direction of the upper and lower polishing plates; an outer side region portion which is positioned on an outer edge side of the upper and lower polishing plates when moving in an outer edge direction of the upper and lower polishing plates and which extends by a required length in a radial direction of the upper and lower polishing plates; and an intermediate region portion which is positioned between the inner side region portion and the outer side region portion and which extends by a required length in a radial direction of the upper and lower polishing plates, and wherein a length of each of the inner side region portion and the outer side region portion extending in a circumferential direction of the upper and lower polishing plates is set so as to become longer than a length of the intermediate region portion extending in a circumferential direction of the upper and lower polishing plates.