发明名称 HARD COATING FILM AND METHOD OF FORMING SAME
摘要 The present invention relates to a hard coating film that is formed on a substrate, that is provided with a layer (A) of which the composition is [Ti(BCN)] and a layer (B) of which the composition is [TiAl(CN)], [AlCr(CN)], [TiCrAlSi(CN)], or [TiSi(CN)], and that is characterized in that: a foundation layer comprising the layer (B) is formed on the substrate; an adhesion-reinforcing layer in which the layer (A) and the layer (B) are stacked repeatedly in an alternating manner is formed on the foundation layer; the thickness of the layer (A) increases compared to the foundation layer (2) side as the thickness of the adhesion-reinforcing layer increases; and the maximum thickness of the layer (A) is 20-50 nm. The hard coating film is formed on the substrate surface of a jig tool or the like, has high coating film hardness, and exhibits excellent adhesion and wear resistance during cutting and the like.
申请公布号 US2017009333(A1) 申请公布日期 2017.01.12
申请号 US201515119322 申请日期 2015.02.19
申请人 KABUSHIKI KAISHA KOBE SEIKO SHO (KOBE STEEL, LTD.) 发明人 NII Hiroaki;YAMAMOTO Kenji
分类号 C23C14/06;C23C14/32;C22C14/00;C23C14/34 主分类号 C23C14/06
代理机构 代理人
主权项 1. A hard film to be formed on a substrate, the hard film comprising: a layer A having a composition of Tiw(BxC1-x-yNy)1-w satisfying 0.2≦w≦0.6 0.1≦x≦0.8, 0≦y≦0.5 and 0≦1−x−y≦0.5; and a layer B having a composition of any one of Ti1-aAla(C1-kNk), AlbCr1-b(C1-kNk), Ti1-c-d-eCrcAldSie(C1-kNk) and Ti1-fSif(C1-kNk), which satisfies 0.3≦a≦0.7, 0.3≦b≦0.8, 0.3≦d≦0.7, c≦0.3, 0≦e≦0.3, 1−c−d−e≦0.3, 0.05≦f≦0.3 and 0.5≦k≦1, wherein an underlying layer formed of the layer B is formed on the substrate, and an adhesion reinforcing layer in which the layers A and the layers B are alternately repeatedly laminated on one another is formed on the underlying layer, and the layer A is increased in thickness compared to that on the underlying layer side with an increase in thickness of the adhesion reinforcing layer, and a maximum thickness of the layer A is 20 to 50 nm.
地址 Kobe-shi JP
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