发明名称 |
HARD COATING FILM AND METHOD OF FORMING SAME |
摘要 |
The present invention relates to a hard coating film that is formed on a substrate, that is provided with a layer (A) of which the composition is [Ti(BCN)] and a layer (B) of which the composition is [TiAl(CN)], [AlCr(CN)], [TiCrAlSi(CN)], or [TiSi(CN)], and that is characterized in that: a foundation layer comprising the layer (B) is formed on the substrate; an adhesion-reinforcing layer in which the layer (A) and the layer (B) are stacked repeatedly in an alternating manner is formed on the foundation layer; the thickness of the layer (A) increases compared to the foundation layer (2) side as the thickness of the adhesion-reinforcing layer increases; and the maximum thickness of the layer (A) is 20-50 nm. The hard coating film is formed on the substrate surface of a jig tool or the like, has high coating film hardness, and exhibits excellent adhesion and wear resistance during cutting and the like. |
申请公布号 |
US2017009333(A1) |
申请公布日期 |
2017.01.12 |
申请号 |
US201515119322 |
申请日期 |
2015.02.19 |
申请人 |
KABUSHIKI KAISHA KOBE SEIKO SHO (KOBE STEEL, LTD.) |
发明人 |
NII Hiroaki;YAMAMOTO Kenji |
分类号 |
C23C14/06;C23C14/32;C22C14/00;C23C14/34 |
主分类号 |
C23C14/06 |
代理机构 |
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代理人 |
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主权项 |
1. A hard film to be formed on a substrate, the hard film comprising:
a layer A having a composition of Tiw(BxC1-x-yNy)1-w satisfying 0.2≦w≦0.6 0.1≦x≦0.8, 0≦y≦0.5 and 0≦1−x−y≦0.5; and a layer B having a composition of any one of Ti1-aAla(C1-kNk), AlbCr1-b(C1-kNk), Ti1-c-d-eCrcAldSie(C1-kNk) and Ti1-fSif(C1-kNk), which satisfies 0.3≦a≦0.7, 0.3≦b≦0.8, 0.3≦d≦0.7, c≦0.3, 0≦e≦0.3, 1−c−d−e≦0.3, 0.05≦f≦0.3 and 0.5≦k≦1, wherein an underlying layer formed of the layer B is formed on the substrate, and an adhesion reinforcing layer in which the layers A and the layers B are alternately repeatedly laminated on one another is formed on the underlying layer, and the layer A is increased in thickness compared to that on the underlying layer side with an increase in thickness of the adhesion reinforcing layer, and a maximum thickness of the layer A is 20 to 50 nm. |
地址 |
Kobe-shi JP |