发明名称 |
SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME |
摘要 |
A germanium optical receiver in which a dark current is small is achieved. The germanium optical receiver is formed of a p-type germanium layer, a non-doped i-type germanium layer, and an n-type germanium layer that are sequentially stacked on an upper surface of a p-type silicon core layer, a first cap layer made of silicon is formed on the side surface of the i-type germanium layer, and a second cap layer made of silicon is formed on the upper surface and side surface of the n-type germanium layer. The n-type germanium layer is doped with such an element as phosphorus or boron having a covalent bonding radius smaller than a covalent bonding radius of germanium. |
申请公布号 |
US2017012143(A1) |
申请公布日期 |
2017.01.12 |
申请号 |
US201615186521 |
申请日期 |
2016.06.19 |
申请人 |
Renesas Electronics Corporation |
发明人 |
USAMI Tatsuya;OGURA Takashi |
分类号 |
H01L31/0288;H01L31/0352;H01L31/18 |
主分类号 |
H01L31/0288 |
代理机构 |
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代理人 |
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主权项 |
1. A semiconductor device comprising:
a silicon core layer; a first germanium layer of a first conductive type formed on an upper surface of the silicon core layer; a non-doped second germanium layer formed on an upper surface of the first germanium layer; a third germanium layer of a second conductive type different from the first conductive type, the third germanium layer being formed on an upper surface of the second germanium layer; and a cap layer formed on an upper surface of the third germanium layer, wherein the third germanium layer is doped with an element having a covalent bonding radius smaller than a covalent bonding radius of germanium. |
地址 |
Tokyo JP |