发明名称 SILICON-CONTAINING RESIN COMPOSITION
摘要 Provided are a silicon-containing resin composition with which it is possible to form a silica-based coating film in which generation of cracks is minimized, a method for forming a silica-based coating film using the silicon-containing resin composition, and a crack-free silica-based coating film formed using the silicon-containing resin composition. A silicon-containing resin composition including (A) a silicon-containing resin and (S) a solvent, wherein one or more selected from siloxane resins and polysilanes is used as the (A) silicon-containing resin, and the (S) solvent contains a cycloalkyl acetate having a specific structure. Cyclohexyl acetate is preferably used as the cycloalkyl acetate.
申请公布号 WO2017007010(A1) 申请公布日期 2017.01.12
申请号 WO2016JP70239 申请日期 2016.07.08
申请人 TOKYO OHKA KOGYO CO., LTD. 发明人 CHISAKA, Hiroki;KUROKO, Mayumi;NODA, Kunihiro;SHIOTA, Dai
分类号 C08L83/04;C08K5/101;C08L83/16;C09D7/12;C09D183/04;C09D183/16 主分类号 C08L83/04
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