发明名称 METHODS OF FORMING A SUBSTRATE OPENING
摘要 A method of forming a substrate opening includes forming a plurality of side-by-side openings in a substrate. At least some of immediately adjacent side-by-side openings are formed in the substrate to different depths relative one another. Walls that are laterally between the side-by-side openings are removed to form a larger opening having a non-vertical sidewall surface where the walls were removed in at least one straight-line vertical cross-section that passes through the sidewall surface orthogonally to the removed walls.
申请公布号 EP3005406(A4) 申请公布日期 2017.01.11
申请号 EP20140803410 申请日期 2014.04.24
申请人 Micron Technology, Inc. 发明人 KIEHLBAUCH, Mark
分类号 H01L21/306;G02B6/13 主分类号 H01L21/306
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