| 摘要 |
The method involves producing an illuminating pattern of a sample in a position. Relative shifting perpendicular to an illumination direction is produced between detection and the illuminating pattern with step size below resolution limit of a microscope from the position into another position of the illuminating pattern. Detection signals are detected and stored in the two positions. A high-resolution image is produced by offsetting the stored detection signals, where the pattern consists of point-shaped or linear scanning of the sample and generation of a point pattern or line pattern. An independent claim is also included for a microscope consisting of an illumination light. |
