INFRARED REFLECTING SUBSTRATE AND METHOD FOR PRODUCING SAME

摘要

The infrared reflecting substrate (100) includes a first metal oxide layer (21), a second metal oxide layer (22) and a metal layer (30) in this order on a transparent substrate (10). The second metal oxide layer (22) and the metal layer (30) are in direct contact with each other. The first metal oxide layer (21) has a refractive index of 2.2 or more. It is preferable that the second metal oxide layer (22) is formed of a metal oxide that contains tin oxide and zinc oxide, and an oxygen content of the metal oxide is less than the stoichiometric composition. The second metal oxide layer is preferably deposited by a DC sputtering method. A target which contains zinc atoms and tin atoms and is obtained by sintering a metal powder and at least one metal oxide among zinc oxide and tin oxide is preferably used for deposition of the second metal oxide layer. It is preferable that the oxygen concentration in a gas introduced into a sputtering chamber is 8% by volume or less. An infrared reflecting substrate having a high visible light transmittance and excellent durability can be provided by the present invention.