发明名称 Electronic device and method for fabricating the same
摘要 This technology provides an electronic device and a method of fabricating the same. An electronic device in accordance with an implementation of this document includes a transistor comprising a gate where at least a portion of the gate is filled in a semiconductor substrate including an active region defined by an isolation layer; a junction which is disposed over the active region at both side of the gate and includes a metal-containing layer and a first semiconductor layer doped with an impurity and interposed between the active region and the metal-containing layer; and a material layer which is interposed between the junction and the active region to prevent diffusion of the impurity from the first semiconductor layer and defines an opening for coupling the junction to the active region.
申请公布号 US9543358(B2) 申请公布日期 2017.01.10
申请号 US201414341694 申请日期 2014.07.25
申请人 SK hynix Inc. 发明人 Kim Joong-Sik
分类号 H01L27/22;H01L29/423;H01L29/78;H01L43/08;H01L45/00;H01L27/24;H01L29/06;H01L29/08 主分类号 H01L27/22
代理机构 Perkins Coie LLP 代理人 Perkins Coie LLP
主权项 1. An electronic device comprising a transistor, wherein the transistor comprises: a substrate including an active region and an isolation layer which defines the active region; a gate formed on the substrate to include at least a portion of the gate which is filled in the substrate; a junction which is disposed over the active region at both sides of the gate and includes a metal-containing layer and a first semiconductor layer doped with an impurity and interposed between the active region and the metal-containing layer; and a material layer which is interposed between the junction and the active region to prevent diffusion of the impurity from the first semiconductor layer and defines an opening for coupling the junction to the active region.
地址 Icheon-Si KR
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