发明名称 Method for calibrating a manufacturing process model
摘要 Calibration of models for manufacturing processes that are subject to circuit layout proximity effects is performed, including optical proximity correction (OPC) model calibration. A target structure is produced using a layout and a manufacturing process. The target structure is illuminated and an electromagnetic scattering property is detected. A manufacturing process model for simulation of the manufacturing process is produced, which comprises at least one manufacturing process parameter determining a model electromagnetic scattering property using the manufacturing process model and the layout. The model electromagnetic scattering property is compared to the detected electromagnetic scattering property and based on the result of the comparison, calibrated manufacturing process parameters are output for calibrating the manufacturing process model. The determining and the layout may include determining structural information corresponding to the target structure using the manufacturing process model and determining the model electromagnetic scattering property using the structural information.
申请公布号 US9541500(B2) 申请公布日期 2017.01.10
申请号 US201213599385 申请日期 2012.08.30
申请人 ASML Netherlands B.V.;National Taiwan University 发明人 Tsai Kuen-Yu;Chen Alek Chi-Heng;Li Jia-Han
分类号 G06F17/50;G01N21/47;G01N21/956 主分类号 G06F17/50
代理机构 Sterne, Kessler, Goldstein & Fox P.L.L.C. 代理人 Sterne, Kessler, Goldstein & Fox P.L.L.C.
主权项 1. A method of calibrating a manufacturing process model comprising: measuring, using a scatterometer, a diffraction pattern generated by illuminating a target structure, the target structure having been produced by a layout for the target structure and a manufacturing process; providing a manufacturing process model for simulation of the manufacturing process, the manufacturing process model comprising manufacturing process parameters; determining structural information corresponding to the target structure using the manufacturing process model; determining a model diffraction pattern using the structural information; comparing the model diffraction pattern to the measured diffraction pattern and calculating a merit function based on a result of the comparison; generating calibrated manufacturing process parameters based on a result of the merit function; and calibrating the manufacturing process model using the generated calibrated manufacturing process parameters.
地址 Veldhoven NL