发明名称 MEMS device with a bonding layer embedded in the cap
摘要 Embodiments of a semiconductor device structure are provided. The semiconductor device structure includes a cap structure. The cap structure includes: a first bonding layer and a cap substrate, and the first bonding layer is embedded in the cap substrate. The semiconductor device structure also includes a substrate structure. The substrate structure includes a substrate and a second bonding layer formed on the substrate. The substrate includes a micro-electro-mechanical system (MEMS) substrate or a semiconductor substrate. The cap structure is bonded to the substrate structure by bonding the first bonding layer and the second bonding layer.
申请公布号 US9540231(B2) 申请公布日期 2017.01.10
申请号 US201414166492 申请日期 2014.01.28
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. 发明人 Chang Kai-Fung;Tsai Lien-Yao;Leu Len-Yi
分类号 B81B7/00;B81C1/00;B81B3/00 主分类号 B81B7/00
代理机构 Birch, Stewart, Kolasch & Birch, LLP 代理人 Birch, Stewart, Kolasch & Birch, LLP
主权项 1. A semiconductor device structure, comprising: a substrate, wherein the substrate comprises a micro electro mechanical system (MEMS) substrate or a semiconductor substrate; a cap substrate disposed above the substrate, wherein the cap substrate comprises an extending portion extending from a bottom surface of the cap substrate towards the substrate; an eutectic alloy formed between the cap structure and the substrate, wherein at least two of the outer sidewalls of the eutectic alloy are in direct contact with the cap substrate; and a bonding layer formed between the cap structure and the substrate, wherein the bonding layer is in contact with the extending portion and the substrate, wherein the eutectic alloy is made of a first material and a second material, and the bonding layer is made of one of the first material and the second material.
地址 Hsin-Chu TW