Lithographic apparatus and device manufacturing method involving a sensor detecting a radiation beam through liquid

摘要

A lithographic projection apparatus and device manufacturing method is disclosed in which a space between a projection system and an object on a substrate table, is at least partly filled with a liquid. A sensor is positioned to be illuminated by a beam of radiation once it has passed through the liquid. An edge seal member may be provided to at least partly surround an edge of the sensor and to provide a primary surface facing the projection system substantially co-planar with a primary surface of the sensor.

主权项

1. A lithographic projection apparatus comprising:
a substrate table configured to hold a substrate; a projection system adapted to project a patterned beam onto a target portion of the substrate; a liquid supply system configured to at least partly fill a space between the projection system and an object on the substrate table, with a liquid; a part of a sensor system, the sensor system part capable of being positioned to be illuminated by a beam of radiation; an edge member, other than the substrate, configured to at least partly extend along an edge of the sensor system part and to provide a primary surface facing the projection system substantially co-planar with a primary surface of the sensor system part; and a low pressure exhaust orifice terminating an end of a low pressure exhaust passage, the low pressure exhaust orifice located underneath at least part of the edge member and defined in an upwardly facing surface.