发明名称 |
Self-aligned carbon nanotube transistor including source/drain extensions and top gate |
摘要 |
A carbon nanotube semiconductor device includes at least one carbon nanotube disposed on an insulator portion of a substrate. The at least one carbon nanotube includes a non-doped channel portion interposed between a first doped source/drain portion and a second doped source/drain portion. A first source/drain contact stack is disposed on the first doped source/drain portion and an opposing second source/drain contact stack is disposed on the second doped source/drain portion. A replacement metal gate stack is interposed between the first and second source/drain contact stacks, and on the at least one carbon nanotube. The first and second doped source/drain portions are each vertically aligned with an inner edge of the first and second contact stacks, respectively. |
申请公布号 |
US9543535(B1) |
申请公布日期 |
2017.01.10 |
申请号 |
US201514753609 |
申请日期 |
2015.06.29 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
Afzali-Ardakani Ali;Franklin Aaron D.;Tulevski George S. |
分类号 |
H01L51/00;H01L51/05 |
主分类号 |
H01L51/00 |
代理机构 |
Cantor Colburn LLP |
代理人 |
Cantor Colburn LLP ;Alexanian Vazken |
主权项 |
1. A carbon nanotube semiconductor device, comprising:
at least one carbon nanotube disposed on an insulator portion of a substrate, the at least one carbon nanotube including a non-doped channel portion interposed between a first doped source/drain portion and a second doped source/drain portion; a first source/drain contact stack on the first doped source/drain portion and an opposing second source/drain contact stack on the second doped source/drain portion; and a replacement metal gate stack interposed between the first and second source/drain contact stacks and on the at least one carbon nanotube; wherein the first and second doped source/drain portions are each vertically aligned with an inner edge of the first and second contact stacks, respectively. |
地址 |
Armonk NY US |