发明名称 Self-aligned carbon nanotube transistor including source/drain extensions and top gate
摘要 A carbon nanotube semiconductor device includes at least one carbon nanotube disposed on an insulator portion of a substrate. The at least one carbon nanotube includes a non-doped channel portion interposed between a first doped source/drain portion and a second doped source/drain portion. A first source/drain contact stack is disposed on the first doped source/drain portion and an opposing second source/drain contact stack is disposed on the second doped source/drain portion. A replacement metal gate stack is interposed between the first and second source/drain contact stacks, and on the at least one carbon nanotube. The first and second doped source/drain portions are each vertically aligned with an inner edge of the first and second contact stacks, respectively.
申请公布号 US9543535(B1) 申请公布日期 2017.01.10
申请号 US201514753609 申请日期 2015.06.29
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 Afzali-Ardakani Ali;Franklin Aaron D.;Tulevski George S.
分类号 H01L51/00;H01L51/05 主分类号 H01L51/00
代理机构 Cantor Colburn LLP 代理人 Cantor Colburn LLP ;Alexanian Vazken
主权项 1. A carbon nanotube semiconductor device, comprising: at least one carbon nanotube disposed on an insulator portion of a substrate, the at least one carbon nanotube including a non-doped channel portion interposed between a first doped source/drain portion and a second doped source/drain portion; a first source/drain contact stack on the first doped source/drain portion and an opposing second source/drain contact stack on the second doped source/drain portion; and a replacement metal gate stack interposed between the first and second source/drain contact stacks and on the at least one carbon nanotube; wherein the first and second doped source/drain portions are each vertically aligned with an inner edge of the first and second contact stacks, respectively.
地址 Armonk NY US