Sputtering target for magnetic recording film

摘要

Provided is a sputtering target for a magnetic recording film. The sputtering target has a peak intensity ratio (IG/ID) of a G-band to a D-band of 5.0 or more in Raman scattering spectrometry. It is an object of the present invention to produce a magnetic thin film having a granular structure without using a high cost co-sputtering apparatus and to provide a sputtering target, in particular, an Fe—Pt-based sputtering target for a magnetic recording film, where carbon particles are dispersed in the target. Since carbon is a material which is not susceptible to being sintered and is susceptible to form aggregates, a conventional carbon-containing sputtering target has the problem that detachment of carbon lumps occurs during sputtering to result in generation of a large number of particles on the film. The present invention also addresses the problem of providing a high density sputtering target that can overcome the disadvantages.

主权项

1. A sputtering target having a sintered body for a magnetic recording film comprising:
a metal matrix having a composition comprising Pt in an amount of 5 mol % or more and 60 mol % or less and a balance of Fe; and carbon particles in a form of flaked graphite dispersed in the metal matrix in an amount of 10 mol % or more and 70 mol % or less, and having a peak intensity ratio (IG/ID) of 5.0 or more for a peak intensity of the G-band, IG, and a peak intensity of the D-band, ID, in Raman scattering spectrometry, wherein the sputtering target further comprises 0.5 mol % or more and 20 mol % or less of particles of at least one oxide additive selected from the group consisting of SiO2 ,Cr2O3, CoO, Ta2O5, B2O3,MgO, and Co3O4.