Ionic thermal acid generators for low temperature applications

摘要

New ionic thermal acid generator compounds are provided. Also provided are photoresist compositions, antireflective coating compositions, and chemical trim overcoat compositions, and methods of using the compositions.

主权项

1. A method for providing a photoresist relief image, comprising:
a) applying a coating layer of a chemically amplified photoresist composition on a substrate; b) exposing the photoresist layer to activating radiation and developing the exposed photoresist layer to provide a photoresist relief image; c) applying over the exposed photoresist composition coating layer a coating layer of a chemical trim overcoat composition comprising a thermal acid generator of formula (I);
(A−)(BH)+  (I) in which A− is the anion of an organic or inorganic acid having a pKa of not more than 3; and (BH)+ is the monoprotonated form of a nitrogen-containing base B having a pKa between 0 and 5.0, and a boiling point less than 170° C.; d) heating the chemical trim overcoat composition layer; and e) developing the photoresist layer to provide a photoresist relief image.