发明名称 Substrate support with controlled sealing gap
摘要 Embodiments of substrate supports are provided herein. In some embodiments, a substrate support may include a support plate having a support surface to support a substrate, a support ring to support a substrate at a perimeter of the support surface; and a plurality of first support elements disposed in the support ring, wherein an end portion of each of the first support elements is raised above an upper surface of the support ring to define a gap between the upper surface of the support ring and an imaginary plane disposed on the end portions of the plurality of first support elements.
申请公布号 US9543186(B2) 申请公布日期 2017.01.10
申请号 US201313756719 申请日期 2013.02.01
申请人 APPLIED MATERIALS, INC. 发明人 Cuvalci Olkan;Huston Joel M.;Tzu Gwo-Chuan
分类号 H01L21/683;H01L21/687;B25B11/00;H01L21/67 主分类号 H01L21/683
代理机构 Moser Taboada 代理人 Moser Taboada ;Taboada Alan
主权项 1. A substrate support, comprising: a support plate having a support surface to support a substrate, wherein the support surface spans the entire width of the support plate; a support ring to support a substrate at a perimeter of the substrate support; a plurality of first support elements disposed in the support ring, wherein an end portion of each of the first support elements is raised above an upper surface of the support ring to define a gap between the upper surface of the support ring and an imaginary plane disposed on the end portions of the plurality of first support elements; a vacuum source; and one or more ports disposed in the support surface of the support plate, wherein all ports disposed in the support surface are fluidly coupled to the vacuum source, and wherein the support ring rests on the support plate along an entire circumference of the support ring.
地址 Santa Clara CA US