Exposure method, exposure apparatus, and method of manufacturing device

摘要

In an exposure method of performing a scan exposure of a substrate, held by a substrate stage, in a first direction for each shot region, a surface position of an exposure area is pre-measured before the exposure area reaches a region, to be irradiated with exposure light, of the substrate, movement of the substrate stage in order to change a shot region to undergo the scan exposure includes first movement in which the substrate stage moves along a curved trajectory, and second movement in which the substrate stage rectilinearly moves in the first direction, and, while the movement of the substrate stage is the first movement, the surface position is pre-measured, and a pre-measure position in a shot region is common among a plurality of shot regions.

主权项

1. An exposure method of performing a scan exposure of a substrate, held by a substrate stage, in a first direction for each shot region of the substrate, the method comprising:
a first scan exposure step of performing a scan exposure of a shot region of the substrate; a measuring step of measuring a surface position of a next shot region to undergo a scan exposure after the first scan exposure step while the substrate stage moves in a second direction, which is perpendicular to the first direction; and a second scan exposure step of performing the scan exposure of the next shot region based on a measurement result of the measuring step, wherein the shot region and the next shot region are arranged at different positions in the first direction and adjacent to each other in the second direction.