MOVABLE BODY DRIVE METHOD, MOVABLE BODY DRIVE SYSTEM, PATTERN FORMATION METHOD, PATTERN FORMING APPARATUS, EXPOSURE METHOD, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD

摘要

Positional information of a movable body in a Y-axis direction is measured using an interferometer and an encoder whose short-term stability of measurement values excels when compared with the interferometer, and based on the measurement results, a predetermined calibration operation for obtaining correction information for correcting measurement values of the encoder is performed. Accordingly, by using measurement values of the interferometer, correction information for correcting the measurement values of the encoder whose short-term stability of the measurement values excels the interferometer is obtained. Then, based on the measurement values of the encoder and the correction information, the movable body is driven in the Y-axis direction with good precision.

主权项

1. An exposure apparatus that has an illumination optical system to illuminate a mask with an illumination light and a projection optical system to project a pattern image of the illuminated mask onto a substrate, the apparatus comprising:
a frame member that supports the projection optical system and that is supported via a first vibration isolation mechanism; a first stage system that has a first movable body and a first electromagnetic motor, the first movable body being disposed above the projection optical system and configured to hold the mask, and the first electromagnetic motor driving the first movable body; a first encoder system in which one of a first grating section and a first head is provided at the first movable body, and which measures positional information of the first movable body with a plurality of the first heads that each irradiate a reflection type grating of the first grating section with a first measurement beam; a base member disposed below the projection optical system and that is supported via a second vibration isolation mechanism that is different from the first vibration isolation mechanism; a second stage system that has a plurality of second movable bodies and a second electromagnetic motor, the plurality of second movable bodies being disposed on the base member and each configured to hold a substrate, and the second electromagnetic motor driving the plurality of second movable bodies; a detection system that is disposed away from the projection optical system and detects a mark of the substrate or marks of the second movable bodies; a second encoder system that has a plurality of second heads and measures positional information of the second movable bodies, the plurality of second heads each irradiating a second grating section having a reflection type grating with a second measurement beam, and the second grating section being disposed substantially parallel to a predetermined plane that is orthogonal to an optical axis of the projection optical system; and a controller coupled to the first and the second encoder systems, that controls the first electromagnetic motor based on measurement information of the first encoder system and also controls the second electromagnetic motor based on measurement information of the second encoder system so that scanning exposure of the substrate is performed, in the scanning exposure the mask and the substrate being each moved relative to the illumination light in an exposure operation of the substrate.