发明名称 |
METHOD FOR PATTERNING AMORPHOUS ALLOY, AMORPHOUS ALLOY PATTERN STRUCTURE USING THE SAME, DOME SWITCH, AND METHOD FOR MANUFACTURING DOME SWITCH |
摘要 |
A method for patterning an amorphous alloy is provided. The method includes forming a pattern for defining an amorphous alloy deposition region on a parent material, forming an amorphous alloy deposition layer on the parent material with the pattern formed thereon, and etching a region except for the amorphous alloy deposition region. A dome switch is provided. The dome switch includes a metal layer shaped like a dome, a central portion of which protrudes, and, in response to external force being received through the protruding central portion, the central portion contacting and electrically connected to a circuit board, and an amorphous alloy layer disposed on the metal layer. Accordingly, an amorphous alloy structure with enhanced durability and reliability is easily manufactured. |
申请公布号 |
US2017004931(A1) |
申请公布日期 |
2017.01.05 |
申请号 |
US201615095609 |
申请日期 |
2016.04.11 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
PARK Eun-soo;PARK Keum-hwan;LEE Ju-ho;PARK Jin-man |
分类号 |
H01H1/021;H01H11/04 |
主分类号 |
H01H1/021 |
代理机构 |
|
代理人 |
|
主权项 |
1. A method for patterning an amorphous alloy, the method comprising:
forming, on a parent material, a pattern that defines a first region on the parent material as an amorphous alloy deposition region; forming, on the parent material, an amorphous alloy deposition layer on the first region and on a second region on the parent material different from the first region; and etching the second region so that the amorphous alloy deposition layer is removed from the second region. |
地址 |
Suwon-si KR |