发明名称 METHOD FOR PATTERNING AMORPHOUS ALLOY, AMORPHOUS ALLOY PATTERN STRUCTURE USING THE SAME, DOME SWITCH, AND METHOD FOR MANUFACTURING DOME SWITCH
摘要 A method for patterning an amorphous alloy is provided. The method includes forming a pattern for defining an amorphous alloy deposition region on a parent material, forming an amorphous alloy deposition layer on the parent material with the pattern formed thereon, and etching a region except for the amorphous alloy deposition region. A dome switch is provided. The dome switch includes a metal layer shaped like a dome, a central portion of which protrudes, and, in response to external force being received through the protruding central portion, the central portion contacting and electrically connected to a circuit board, and an amorphous alloy layer disposed on the metal layer. Accordingly, an amorphous alloy structure with enhanced durability and reliability is easily manufactured.
申请公布号 US2017004931(A1) 申请公布日期 2017.01.05
申请号 US201615095609 申请日期 2016.04.11
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 PARK Eun-soo;PARK Keum-hwan;LEE Ju-ho;PARK Jin-man
分类号 H01H1/021;H01H11/04 主分类号 H01H1/021
代理机构 代理人
主权项 1. A method for patterning an amorphous alloy, the method comprising: forming, on a parent material, a pattern that defines a first region on the parent material as an amorphous alloy deposition region; forming, on the parent material, an amorphous alloy deposition layer on the first region and on a second region on the parent material different from the first region; and etching the second region so that the amorphous alloy deposition layer is removed from the second region.
地址 Suwon-si KR