发明名称 ABERRATION CORRECTION METHOD, ABERRATION CORRECTION SYSTEM, AND CHARGED PARTICLE BEAM DEVICE
摘要 In order to provide an aberration correction system that achieves a charged particle beam in which anisotropy is reduced or eliminated on a sample surface, even in such instances where there is magnetic interference between poles of an aberration corrector, provided is a correction system that includes the following: a line cross position control device (209) that controls line cross positions of charged particle beams inside an aberration corrector such that a design value and a measured value match; an image shift amount extraction device (210); and a feedback determination device (211) that determines the necessity for changing an excitation amount of the aberration corrector from the image shift amount that has been extracted.
申请公布号 WO2017002243(A1) 申请公布日期 2017.01.05
申请号 WO2015JP69048 申请日期 2015.07.01
申请人 HITACHI HIGH-TECHNOLOGIES CORPORATION 发明人 CHENG Zhaohui;NAKANO Tomonori;URANO Kotoko;OHASHI Takeyoshi;SOHDA Yasunari;KAZUMI Hideyuki
分类号 H01J37/153 主分类号 H01J37/153
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