发明名称 |
ABERRATION CORRECTION METHOD, ABERRATION CORRECTION SYSTEM, AND CHARGED PARTICLE BEAM DEVICE |
摘要 |
In order to provide an aberration correction system that achieves a charged particle beam in which anisotropy is reduced or eliminated on a sample surface, even in such instances where there is magnetic interference between poles of an aberration corrector, provided is a correction system that includes the following: a line cross position control device (209) that controls line cross positions of charged particle beams inside an aberration corrector such that a design value and a measured value match; an image shift amount extraction device (210); and a feedback determination device (211) that determines the necessity for changing an excitation amount of the aberration corrector from the image shift amount that has been extracted. |
申请公布号 |
WO2017002243(A1) |
申请公布日期 |
2017.01.05 |
申请号 |
WO2015JP69048 |
申请日期 |
2015.07.01 |
申请人 |
HITACHI HIGH-TECHNOLOGIES CORPORATION |
发明人 |
CHENG Zhaohui;NAKANO Tomonori;URANO Kotoko;OHASHI Takeyoshi;SOHDA Yasunari;KAZUMI Hideyuki |
分类号 |
H01J37/153 |
主分类号 |
H01J37/153 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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