发明名称 PLASMA REACTOR APPLIED VOLTAGE CONTROL DEVICE AND PLASMA REACTOR CONTROL DEVICE
摘要 [Problem] To provide an applied voltage control device and the like which are capable of controlling, with a high degree of precision, the applied voltage applied between electrodes of a plasma reactor. [Solution] The current output from a pulse generating power source 5 is detected by a current sensor 42, and the values of the detected current are integrated by a current integrating circuit 43. There is a correlation between integrated current value obtained from the integration and the applied voltage value applied between electrodes 23 of a plasma reactor 4, and that relationship is stored in an applied voltage value estimation unit 44. When an integrated current value is obtained, an applied voltage value corresponding to the integrated current value is estimated on the basis of the relationship stored in the applied voltage value estimation unit 44. A power source 31 is then controlled on the basis of the estimated applied voltage value.
申请公布号 WO2017002828(A1) 申请公布日期 2017.01.05
申请号 WO2016JP69187 申请日期 2016.06.29
申请人 DAIHATSU MOTOR CO., LTD. 发明人 SHIMAMURA, Ryoichi;SHIMONAGAYOSHI, Hirochika;NAITO, Kazuya;MADOKORO, Kazuhiko;UENISHI, Mari;TANAKA, Hirohisa;MICHIOKA, Chikara
分类号 H05H1/24;F01N3/01 主分类号 H05H1/24
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