COMPOSITION FOR FORMATION OF RESIST UNDERLAYER FILM AND COMPRISING EPOXY ADDUCT HAVING LONG-CHAIN ALKYL GROUP

摘要

[Problem] To provide a composition for forming a resist underlayer film for the formation of a highly smooth coating on a substrate. [Solution] A composition for forming a resist underlayer film and comprising an epoxy adduct (C) obtained by reacting an epoxy group-containing compound (A), and an epoxy adduct-forming compound (B), wherein an alkyl group having a carbon number of at least 3 and optionally having a branch is included in compound (A) and/or compound (B). The epoxy adduct-forming compound (B) is one selected from the group consisting of a carboxylic acid (B1), a carboxylic acid anhydride (B2), a phenol compound (B3), a hydroxyl group-containing compound (B4), a thiol compound (B5), an amino compound (B6), and an imide compound (B7). The alkyl group having a carbon number of at least 3 and optionally having a branch can be included in the epoxy adduct-forming compound (B). The alkyl group optionally having a branch can have a carbon number of 3-19.