| 发明名称 |
METHODS FOR REMOVING HALOGENATED ETHYLENE IMPURITIES IN 2, 3, 3, 3-TETRAFLUOROPROPENE PRODUCT |
| 摘要 |
Disclosed is a composition comprised of at least one compound selected from 2,3,3,3-tetrafluoropropene, 1,3,3,3-tetrafluoro-1-propene and 1-chloro-3,3,3-trifluoropropene and halogenated impurity selected from the group consisting of HFO-1141 (CH2═CHF), HCFO-1140 (CH2═CHCl), and HCFO-1131 (CH2═CFCl and/or trans/cis-CHF═CHCl) and combination thereof, said halogenated impurity being present in said composition in an amount of 50 ppm or less. |
| 申请公布号 |
US2017001931(A1) |
申请公布日期 |
2017.01.05 |
| 申请号 |
US201615267599 |
申请日期 |
2016.09.16 |
| 申请人 |
HONEYWELL INTERNATIONAL INC. |
发明人 |
WANG Haiyou;TUNG Hsueh Sung |
| 分类号 |
C07C21/18 |
主分类号 |
C07C21/18 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A composition comprised of at least one compound selected from 2,3,3,3-tetrafluoropropene, 1,3,3,3-tetrafluoro-1-propene and 1-chloro-3,3,3-trifluoropropene and halogenated impurity selected from the group consisting of HFO-1141 (CH2═CHF), HCFO-1140 (CH2═CHCl), and HCFO-1131 (CH2═CFCl and/or trans/cis-CHF═CHCl) and combination thereof, said halogenated impurity being present in said composition in an amount of 50 ppm or less. |
| 地址 |
MORRISTOWN NJ US |
