CORRECTION OF NON-UNIFORM PATTERNS USING TIME-SHIFTED EXPOSURES

摘要

An image correction application relating to the ability to apply maskless lithography patterns to a substrate in a manufacturing process is disclosed. The embodiments described herein relate to a software application platform which maintains the ability to correct non-uniform image patterns using time-shifted exposures of the substrate. The application exposes subsequent portions of a substrate to electromagnetic radiation at variable and alternating pulse frequencies using a time delay in order to correct interference patterns and increase exposure uniformity.

主权项

1. A method for correcting non-uniform image patterns on a substrate, comprising:
(a) exposing a first portion of the substrate to a first pulse set of electromagnetic radiation, wherein the first pulse set includes a first pulse exposure and a second pulse exposure, wherein the first pulse exposure and the second pulse exposure are separated in time by a first time interval; and (b) exposing a second portion of the substrate to a second pulse set of electromagnetic radiation, wherein the second pulse set includes a third pulse exposure and a fourth pulse exposure, wherein the third pulse exposure and the fourth pulse exposure are separated in time by between about +30% and about −30% of the first time interval, and wherein the first pulse set of electromagnetic radiation and the second pulse set of electromagnetic radiation are separated in time by a second time interval that is different than the first time interval.