发明名称 |
RADICAL SOURCE AND MOLECULAR BEAM EPITAXY DEVICE |
摘要 |
[Object] To provide a radical generator which can produce radicals at higher density. [Means for Solution] The radical generator includes a supply tube 10 made of SUS, a hollow cylindrical plasma-generating tube 11 which is connected to the supply tube 10 and which is made of pyrolytic boron nitride (PBN). A first cylindrical CCP electrode 13 and a second cylindrical CCP electrode 30 are disposed outside the plasma-generating tube 11. A coil 12 is provided so as to wind about the outer circumference of the plasma-generating tube 11 at the downstream end of the first CCP electrode 13. A thin connecting tube 23 extending from the bottom of the plasma-generating tube 11 is inserted into the supply tube 10. |
申请公布号 |
EP3113583(A1) |
申请公布日期 |
2017.01.04 |
申请号 |
EP20150752360 |
申请日期 |
2015.02.23 |
申请人 |
National University Corporation Nagoya University;Nu System Corporation |
发明人 |
HORI, Masaru;ODA, Osamu;KANO, Hiroyuki |
分类号 |
H05H1/46;C23C14/24;H01L21/203;H01L21/304 |
主分类号 |
H05H1/46 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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