发明名称 RADICAL SOURCE AND MOLECULAR BEAM EPITAXY DEVICE
摘要 [Object] To provide a radical generator which can produce radicals at higher density. [Means for Solution] The radical generator includes a supply tube 10 made of SUS, a hollow cylindrical plasma-generating tube 11 which is connected to the supply tube 10 and which is made of pyrolytic boron nitride (PBN). A first cylindrical CCP electrode 13 and a second cylindrical CCP electrode 30 are disposed outside the plasma-generating tube 11. A coil 12 is provided so as to wind about the outer circumference of the plasma-generating tube 11 at the downstream end of the first CCP electrode 13. A thin connecting tube 23 extending from the bottom of the plasma-generating tube 11 is inserted into the supply tube 10.
申请公布号 EP3113583(A1) 申请公布日期 2017.01.04
申请号 EP20150752360 申请日期 2015.02.23
申请人 National University Corporation Nagoya University;Nu System Corporation 发明人 HORI, Masaru;ODA, Osamu;KANO, Hiroyuki
分类号 H05H1/46;C23C14/24;H01L21/203;H01L21/304 主分类号 H05H1/46
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