发明名称 Imprint method, imprint apparatus, and process for producing chip
摘要 An imprint method for imprinting an imprint pattern of a mold onto a pattern formation material on a substrate so as to realize a high throughput includes the steps of bringing the imprint pattern and the pattern formation material into contact with each other; applying a first pressure between the mold and the substrate to increase a contact area between the imprint pattern and the pattern formation material; and adjusting a positional relationship between the mold and the substrate at a second pressure lower than the first pressure.
申请公布号 EP2073059(B1) 申请公布日期 2017.01.04
申请号 EP20090151853 申请日期 2006.10.16
申请人 Canon Kabushiki Kaisha 发明人 Seki, Junichi;Suehira, Nobuhito
分类号 G03F7/00;B81C99/00 主分类号 G03F7/00
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