发明名称 Method and system of layout placement based on multilayer gridlines
摘要 A method of forming a layout design for fabricating an integrated circuit is disclosed. The method includes identifying a line pattern of a first set of grid lines with respect to a second set of grid lines within a region of the layout design; and placing a k-th standard cell layout of the K standard cell layouts at the region of the layout design if the line pattern is determined to match a k-th predetermined line pattern of K predetermined line patterns. K is an integer equal to or greater than two, and k is an order index ranging from 1 to K. The region of the layout design is sized to fit one of K different standard cell layouts corresponding to a same standard cell functionality.
申请公布号 US9536032(B2) 申请公布日期 2017.01.03
申请号 US201414554958 申请日期 2014.11.26
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. 发明人 Chiang Ting-Wei;Tien Li-Chun;Zhuang Hui-Zhong;Jiang Zhe-Wei
分类号 G06F17/50;H03K19/02;H01L27/02 主分类号 G06F17/50
代理机构 Hauptman Ham, LLP 代理人 Hauptman Ham, LLP
主权项 1. A method of forming a layout design for fabricating an integrated circuit, the method comprising: identifying a line pattern of a first set of grid lines with respect to a second set of grid lines within a region of the layout design, the region of the layout design being sized to fit one of K different standard cell layouts corresponding to a same standard cell functionality, K being an integer equal to or greater than two, the first set of grid lines extending along a first direction and corresponding to placement of a first set of layout patterns of a first layout layer of the layout design, the second set of grid lines extending along the first direction and corresponding to placement of a second set of layout patterns of a second layout layer of the layout design, the first set of grid lines having a first line pitch, and the second set of grid lines having a second line pitch different from the first line pitch, wherein the line pattern includes a layout pattern aligned with a grid line of the first set of grid lines overlapping a layout pattern aligned with a grid line of the second set of grid lines; and placing a k-th standard cell layout of the K standard cell layouts at the region of the layout design if the line pattern is determined to match a k-th predetermined line pattern of K predetermined line patterns, k being an order index ranging from 1 to K, and at least one of the above operations being performed by a hardware processor.
地址 TW