发明名称 |
Support for a movable element and lithography apparatus |
摘要 |
A support for a movable element includes a stator element, a gravity compensator field inducing element mounted on the stator element, the gravity compensator field inducing element configured to apply a translational force to the movable element by controlling a magnetic field in a gap between the stator element and the movable element, and a plurality of torque compensator field inducing elements mounted on the stator element, the torque compensator field inducing elements configured to apply a torque to the movable element by controlling a magnetic field in the gap between the stator element and the movable element, the torque being about a first axis substantially perpendicular to the direction of the translational force applied by the gravity compensator field inducing element. |
申请公布号 |
US9535340(B2) |
申请公布日期 |
2017.01.03 |
申请号 |
US201314413667 |
申请日期 |
2013.05.15 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
Boon Fidelus Adrianus;Hol Sven Antoin Johan;Fischer Olof Martinus Josephus |
分类号 |
G03B27/54;G03F7/20;F16C32/04 |
主分类号 |
G03B27/54 |
代理机构 |
Pillsbury Winthrop Shaw Pittman LLP |
代理人 |
Pillsbury Winthrop Shaw Pittman LLP |
主权项 |
1. A support for a movable element, the support comprising:
a stator element; a gravity compensator field inducing element mounted on the stator element, the gravity compensator field inducing element configured to apply a translational force, in a direction with at least a component parallel to the direction of gravity, to the movable element by controlling a magnetic field in a gap between the stator element and the movable element; and a plurality of torque compensator field inducing elements, separate from the gravity compensator field inducing element, mounted on the stator element, the torque compensator field inducing elements configured to apply a torque to the movable element by controlling a magnetic field in the same gap between the stator element and the movable element, the torque being about a first axis substantially perpendicular to the direction of the translational force applied by the gravity compensator field inducing element. |
地址 |
Veldhoven NL |