| 发明名称 | Vapour deposition process for the preparation of a phosphate compound | ||
| 摘要 | The present invention provides a vapour deposition process for the preparation of a phosphate compound, wherein the process comprises providing each component element of the phosphate compound as a vapour, and co-depositing the component element vapours on a common substrate, wherein the component elements react on the substrate to form the phosphate compound. | ||
| 申请公布号 | US9533886(B2) | 申请公布日期 | 2017.01.03 |
| 申请号 | US201214117823 | 申请日期 | 2012.07.20 |
| 申请人 | Ilika Technologies Ltd.;Toyota Motor Corporation | 发明人 | Hayden Brian Elliott;Lee Christopher Edward;Smith Duncan Clifford Alan;Beal Mark Stephen;Lu Xiaojuan;Yada Chihiro |
| 分类号 | C23C14/08;C01B25/30;C23C14/06;C23C14/24;C30B23/06;C30B23/08;H01M4/58;C01B21/20;C01B25/45;H01M10/052 | 主分类号 | C23C14/08 |
| 代理机构 | LeClairRyan, a Professional Corporation | 代理人 | LeClairRyan, a Professional Corporation |
| 主权项 | 1. A physical vapour deposition process for the preparation of a phosphate compound, wherein the process comprises: providing each component element of the phosphate compound as a vapour from a source, wherein the component elements comprise vapour phase particles having a mean free path that is longer than the distance between the source and a common substrate, thereby minimizing vapour phase collision between the vapour phase particles, and co-depositing the component element vapours on the common substrate, wherein the component elements react on the substrate to form the phosphate compound. | ||
| 地址 | Chilworth, Southampton GB | ||