发明名称 Drawn dummy FeCAP, via and metal structures
摘要 An integrated circuit containing hydrogen permeable dummy vias configured in a linear or rectangular array and symmetrically positioned over a component in the integrated circuit. An integrated circuit containing matching components with identical layouts and hydrogen permeable dummy vias in identical configurations over the matching components. A process of forming an integrated circuit containing matching components with identical layouts and hydrogen permeable dummy vias in identical configurations over the matching components.
申请公布号 US9536822(B2) 申请公布日期 2017.01.03
申请号 US200912576340 申请日期 2009.10.09
申请人 TEXAS INSTRUMENTS INCORPORATED 发明人 Summerfelt Scott R.;Aggarwal Rajni J.
分类号 H01L21/02;H01L21/00;H01L23/522;H01L23/58;H01L27/02;H01L49/02;H01L27/115 主分类号 H01L21/02
代理机构 代理人 Keagy Rose Alyssa;Brill Charles A.;Cimino Frank D.
主权项 1. An integrated circuit, comprising: a substrate; a component located on said substrate; a dielectric layer located on said substrate and above said component; a plurality of electrically active ferroelectric structures located over said dielectric layer; a hydrogen barrier located above said electrically active ferroelectric structures; an inter-level dielectric layer located on said hydrogen barrier; a plurality of electrically active vias located in said inter-level dielectric layer and said hydrogen barrier; and a plurality of hydrogen permeable dummy vias configured in one of a linear array or a rectangular array, said plurality of hydrogen permeable dummy vias symmetrically positioned over said component and located in said inter-level dielectric layer and said hydrogen barrier such that at least a portion of bottom surfaces of said plurality of hydrogen permeable dummy vias contact said dielectric layer.
地址 Dallas TX US