| 摘要 |
An exposure apparatus is equipped with a fine movement stage that can hold a liquid with a projection optical system when the stage is at a position facing an outgoing surface of the projection optical system, and a blade that comes into proximity within a predetermined distance of the fine movement stage when the fine movement stage is holding the liquid with the projection optical system, and moves along with the fine movement stage while maintaining the proximity state, and then holds the liquid with the projection optical system after the movement. Accordingly, a plurality of stages will not have to be placed right under the projection optical system interchangeably, which can suppress an increase in footprint of the exposure apparatus. |
| 主权项 |
1. An exposure apparatus that exposes a substrate with illumination light via a projection optical system and a liquid, the apparatus comprising:
a local liquid immersion device having a nozzle member provided surrounding an optical member, in contact with the liquid, of the projection optical system, the local liquid immersion device forming a liquid immersion area with a liquid supplied to an area under the projection optical system via the nozzle member and recovering the liquid of the liquid immersion area via the nozzle member; a base member placed under the projection optical system and having a surface placed substantially parallel to a predetermined plane orthogonal to an optical axis of the projection optical system; a substrate stage placed above the base member and holding the substrate, the substrate stage having a holding member and a main body section, the holding member having a mounting area of the substrate provided on an upper surface side and a measurement surface having a grating and provided on a lower surface side, and the main body section supporting the holding member so that a space is formed between the measurement surface and the surface of the base member; a drive system having an electromagnetic motor that drives the substrate stage; a measurement system that has a head section placed lower than the measurement surface under the projection optical system, and measures positional information of the substrate stage by irradiating the measurement surface with a measurement beam from below via the head section that is placed in the space as the substrate stage is positioned facing the projection optical system; a movable member placed on the base member and having an upper surface; and a controller coupled to the drive system, that controls driving of the substrate stage by the electromagnetic motor based on measurement information of the measurement system, wherein in order for the substrate stage and the movable member, one of which is placed facing the projection optical system, to approach each other, the controller relatively moves the other of the substrate stage and the movable member with respect to the one of the substrate stage and the movable member, and in order for the other of the substrate stage and the movable member to be placed facing the projection optical system in place of the one of the substrate stage and the movable member, the controller relatively moves the substrate stage and the movable member that have approached with respect to the nozzle member. |
