发明名称 |
Porous resin particles, method for manufacturing the same, dispersion liquid, and use thereof |
摘要 |
Porous resin particles are disclosed that comprise a polymer of a monomer mixture. The monomer mixture includes: a mono(meth)acrylate-based monomer in an amount of 3 wt % to 40 wt % containing: an ethylenic unsaturated group only in a (meth)acrylic acid residue; and a hydroxyl group and at least either an ether group or an ester group in an alcohol residue; another monofunctional vinyl-based monomer in an amount of 10 wt % to 69 wt % containing a single ethylenic unsaturated group; and a polyfunctional vinyl-based monomer in an amount of 30 wt % to 70 wt % containing two or more ethylenic unsaturated groups. |
申请公布号 |
US9532940(B2) |
申请公布日期 |
2017.01.03 |
申请号 |
US201214372116 |
申请日期 |
2012.07.31 |
申请人 |
Sekisui Plastics Co., Ltd. |
发明人 |
Ishimori Fumitaka;Harada Ryosuke |
分类号 |
A61K8/02;A61Q19/00;C09D201/00;A61K8/81;C08F220/26;C09D7/12;C08F2/24;C08F220/14;C08F222/10;A61Q1/12;C08F120/26;C08K5/05;C08J9/28;C08J9/16;C09D7/00;C08J3/12;C08F2/44 |
主分类号 |
A61K8/02 |
代理机构 |
Locke Lord LLP |
代理人 |
Locke Lord LLP |
主权项 |
1. Porous resin particles of a polymer of a monomer mixture,
said monomer mixture comprising: a mono(meth)acrylate-based monomer in an amount of 3 wt % to 40 wt % containing: an ethylenic unsaturated group only in a (meth)acrylic acid residue, and a hydroxyl group and at least either an ether group or an ester group in an alcohol residue; another monofunctional vinyl-based monomer in an amount of 10 wt % to 69 wt % containing a single ethylenic unsaturated group; and a polyfunctional vinyl-based monomer in an amount of 30 wt % to 70 wt % containing two or more ethylenic unsaturated groups, wherein the porous resin particles have a water absorption value of 140 ml to 400 ml per 100 g of said particles, and an oil absorption value of 100 ml to 400 ml per 100 g of said particles. |
地址 |
Osaka-shi JP |