Reticle, system comprising a plurality of reticles and method for the formation thereof

摘要

A method includes providing a pre-optical proximity correction (OPC) layout of at least a portion of at least one reticle. The pre-OPC layout defines a test cell including a first test cell area having a plurality of first target features having a first pitch and a second test cell area having a plurality of second target features having a second pitch. A post-OPC layout of the portion of the reticle is formed on the basis of the pre-OPC layout. The formation of the post-OPC layout includes performing a rule-based OPC process, wherein a plurality of first reticle features for the first test cell area are provided on the basis of the plurality of first target features, and performing a model-based OPC process, wherein a plurality of second reticle features for the second test cell area are provided on the basis of the plurality of second target features.

主权项

1. A method, comprising:
providing a pre-optical proximity correction (OPC) layout of at least a portion of at least one reticle, said pre-OPC layout comprising a test cell comprising a first test cell area and a second test cell area, said first test cell area comprising a plurality of first target features having a first pitch, said second test cell area comprising a plurality of second target features having a second pitch; forming a post-OPC layout of said at least a portion of said at least one reticle on the basis of said pre-OPC layout, the formation of said post-OPC layout comprising:
performing a rule-based OPC process wherein a plurality of first reticle features for said first test cell area are provided on the basis of said plurality of first target features; andperforming a model-based OPC process wherein a plurality of second reticle features for said second test cell area are provided on the basis of said plurality of second target features.