Chamber pressure control apparatus for chemical vapor deposition systems

摘要

In one embodiment, a pressure control assembly includes a cylindrical hollow body having an opening to receive a ballast gas, a first and second flange, and a first and second cone. The first flange is coupled to a first end of the body, and a second flange is coupled to an opposing end of the body. The first cone is coupled to the first flange, and the second cone is coupled to the second flange. A method for controlling pressure in a chamber includes measuring a pressure of the chamber and a pressure of an exhaust system coupled to the chamber. The method includes dynamically adjusting the pressure in the exhaust system in order to adjust the pressure in the chamber, by creating a first pressure drop that is greater than a second pressure drop in the exhaust system.

主权项

1. A pressure control assembly, comprising:
a cylindrical hollow body having an opening to receive a ballast gas; a first flange coupled to a first end of the body; a second flange coupled to an opposing second end of the body; a first cone coupled to the first flange at the first end, wherein the first cone has a first and second opening, and wherein the first opening of the first cone is at the first flange; and a second cone coupled to the second flange at the second end, wherein the second cone has a first and second opening, and wherein the first opening of the second cone faces the second opening of the first cone, and wherein the second opening of the second cone is at the second flange, wherein the first opening of the second cone is larger than the second opening of the second cone.