| 摘要 |
PROBLEM TO BE SOLVED: To reduce a relative position deviation amount of transfer patterns formed by projection optical systems neighboring in an overlapping region, and to accurately transfer a pattern of an original plate.SOLUTION: In a projection exposure apparatus using connection exposure, in a region on a substrate in which neighboring transfer patterns overlap, a direction of positional deviation of each transfer pattern decided by telecentricity or asymmetric aberration of first and second projection optical systems neighboring is configured to be the same direction with respect to a non-scan direction or a scan direction. |
