| 摘要 |
PROBLEM TO BE SOLVED: To provide an advantageous technique for correcting the positional deviation of a pattern to be transferred on a substrate in an exposure system.SOLUTION: An exposure system exposing a substrate with exposure light includes: a substrate stage movable while holding the substrate; a position control system controlling the position of the substrate stage; a control section controlling the position control system; and a storage section storing control characteristics of the substrate stage by the position control system. The control section corrects the command value of the position of the substrate stage in the position control system on the basis of a part corresponding to a period for exposing the substrate in the control characteristics stored by the storage section. |
