发明名称 SEMICONDUCTOR DEVICE AND PRODUCTION METHOD THEREFOR
摘要 Provided is a semiconductor device having a wiring structure on a semiconductor element and capable of securing high quality and high reliability in response to the desire for high-temperature operations, a large-current specification, thinner wafers, smaller device size, and reduced loss. A semiconductor device that includes an insulating circuit board; a semiconductor element implemented on the insulating circuit board; a first insulating resin layer laminated on the insulating circuit board; a copper-plated wiring which contacts the semiconductor element via a window portion formed in the first insulating resin layer, which enables contact with the semiconductor element; and a second insulating resin layer laminated so as to seal the copper-plated wiring, and a method for producing the semiconductor device are provided.
申请公布号 US2016351487(A1) 申请公布日期 2016.12.01
申请号 US201615064943 申请日期 2016.03.09
申请人 FUJI ELECTRONIC CO., LTD 发明人 Ogura Keisuke
分类号 H01L23/498;H01L23/31 主分类号 H01L23/498
代理机构 代理人
主权项 1. A semiconductor device comprising: an insulating circuit board; a semiconductor element implemented on the insulating circuit board; a first insulating resin layer laminated on the insulating circuit board; a copper-plated wiring which contacts the semiconductor element via a window portion formed on the first insulating resin layer which enables contact with the semiconductor element; and a second insulating resin layer laminated so as to seal the copper-plated interconnection.
地址 Kawasaki-shi JP