| 摘要 |
PROBLEM TO BE SOLVED: To provide a light-shielding film and a production method of the film excellent in light-shielding property, low reflection property, sliding property, conductivity, heat resistance and resistance to high temperature and high humidity, to be used for optical apparatus components such as a diaphragm, a shutter blade or a diaphragm blade of a mobile phone with a camera, a digital camera or a lens shutter of a digital video camera, or a light quantity controlling diaphragm blade of a projector.SOLUTION: The light-shielding film comprises: a resin film substrate (A) having a surface roughness of 0.2 to 2.2 μm in terms of an arithmetic average height Ra; a Ni-based metal film (B) having a film thickness of 50 to 250 nm formed on one surface or both surfaces of the resin film substrate (A) by a sputtering process; and a Ni-based metal oxide film (C) having a film thickness of 100 to 400 nm on the Ni-based metal film (B). The Ni-based metal film (B) has an oxygen content of 0.20 or less in terms of O/Ni atomic number ratio; and the Ni-based metal oxide film (C) has an oxygen content of 0.65 to 0.85 in terms of O/Ni atomic number ratio. The light-shielding film has a minimum optical density of 4 or more and a maximum regular reflectance of 0.4% or less at a wavelength of from 380 to 780 nm. |
