发明名称 PNbZT強誘電体薄膜の形成方法
摘要 A method includes: coating a composition for forming a PZT ferroelectric film not containing Nb on a lower electrode 11 formed on a substrate 10, prebaking the composition, and baking the composition to be crystallized and to thereby form a crystallization promoting layer 12 having a thickness of 45 to 90 nm thereon; coating a composition for forming a PNbZT-based ferroelectric film, containing 4 to 10 at% of Nb in 100 at% of all the perovskite B site atoms (Zr, Ti) contained in the composition, on the formed crystallization promoting layer 12 to form a coating film 13a of PNbZT thereon; and pre-baking the coating film 13a and then baking the coating film 13a to be crystallized and to thereby form a PNbZT ferroelectric thin film on the lower electrode 11.
申请公布号 JP6036460(B2) 申请公布日期 2016.11.30
申请号 JP20130063179 申请日期 2013.03.26
申请人 三菱マテリアル株式会社 发明人 土井 利浩;桜井 英章;曽山 信幸
分类号 C01G33/00;C04B35/491;H01B3/12;H01L21/822;H01L21/8242;H01L21/8246;H01L27/04;H01L27/105;H01L27/108;H01L41/187;H01L41/318;H01L41/319 主分类号 C01G33/00
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