| 摘要 |
An illumination system of a microlithographic projection exposure apparatus (10) comprises an optical integrator (60) having a plurality of light entrance facets (75) each being associated with a secondary light source (106). A spatial light modulator (52) has a light exit surface (57) and transmit or to reflect impinging projection light in a spatially resolved manner. A pupil forming unit (36) directs projection light on the spatial light modulator. An objective (58) images the light exit surface (57) of the spatial light modulator (52) onto the light entrance facets (75) of the optical integrator (60). The light exit surface (57) of the optical light modulator (52) comprises groups (54-1 to 54-8) of object areas (110) being separated by areas (130) that are not imaged on the light entrance facets (75). The objective (58) combines images (110') of the object areas (110) so that the images (110') of the object areas abut on the optical integrator (60). |
