发明名称 |
Positive photosensitive composition |
摘要 |
A positive photosensitive composition comprises a compound capable of generating a specified sulfonic acid upon irradiation with one of an actinic ray and radiation and (B) a resin capable of decomposing under the action of an acid to increase the solubility in an alkali developer. |
申请公布号 |
EP1199603(B1) |
申请公布日期 |
2016.11.30 |
申请号 |
EP20010124329 |
申请日期 |
2001.10.19 |
申请人 |
FUJIFILM CORPORATION |
发明人 |
KODAMA, KUNIHIKO;AOAI, TOSHIAKI |
分类号 |
G03F7/004;C07C309/06;C07C381/12;G03F7/039 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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