发明名称 |
CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS |
摘要 |
A resist composition comprising a resin adapted to be decomposed under the action of acid to increase its solubility in alkaline developer and a sulfonium or iodonium salt of nitrogen-containing carboxylic acid has a high resolution. By lithography, a pattern with minimal LER can be formed. |
申请公布号 |
EP3062150(A3) |
申请公布日期 |
2016.11.30 |
申请号 |
EP20160155252 |
申请日期 |
2016.02.11 |
申请人 |
SHIN-ETSU CHEMICAL CO., LTD. |
发明人 |
KOTAKE, MASAAKI;FUJIWARA, TAKAYUKI;MASUNAGA, KEIICHI;DOMON, DAISUKE;WATANABE, SATOSHI |
分类号 |
G03F7/004;G03F1/78;G03F7/039;G03F7/20;G03F7/32 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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