发明名称 High voltage semiconductor devices
摘要 A high-voltage semiconductor device such as a transistor (20) includes first and second trenches that define a mesa (22a) on a semiconductor substrate (21). First and second field plate members (24a,24b) are respectively disposed in the first and second trenches, with each of the first and second field plate members being separated from the mesa by a dielectric layer (28a). The mesa includes a plurality of sections, each section having a substantially constant doping concentration gradient, the gradient of one section being at least 10% greater than the gradient of another section.
申请公布号 EP1684357(B1) 申请公布日期 2016.11.23
申请号 EP20050254533 申请日期 2005.07.20
申请人 POWER INTEGRATIONS, INC. 发明人 BANERJEE, SUJIT;DISNEY, DONALD RAY
分类号 H01L29/78;H01L21/336;H01L29/06;H01L29/08;H01L29/36;H01L29/40;H01L29/417;H01L29/423 主分类号 H01L29/78
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