EXPOSURE APPARATUS AND EXPOSURE METHOD

摘要

Objective: To use a charged particle beam to form a complex and fine pattern by decreasing movement error of a stage. Means for Achieving the Objective: an exposure apparatus comprising a beam generating section that generates a charged particle beam; a stage section (110) that has a sample (10) mounted thereon and moves the sample relative to the beam generating section; a detecting section (114) that detects a position of the stage section; a predicting section (1000) that generates a predicted drive amount obtained by predicting a drive amount of the stage section based on a detected position of the stage section; and an irradiation control section (170) that performs irradiation control for irradiating the sample with the charged particle beam, based on the predicted drive amount. Also provided is an exposure method.