| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate processing apparatus which extends filter's life.SOLUTION: A substrate processing apparatus 1 includes: a housing 17 holding a filter 16 filtering a process liquid supplied to a substrate W; and a filter cleaning mechanism 22 changing a temperature of the filter 16 held by the housing 17. The filter cleaning mechanism 22 heats and/or cools the filter 16 held by the housing 17 and thereby changing the temperature of the filter 16 and reducing the binding power of an object to the filter 16. |
