| 摘要 |
PROBLEM TO BE SOLVED: To provide a resist composition from which a resist pattern with excellent resolution can be easily obtained.SOLUTION: The resist composition comprises: a resin (E) having a structural unit having a group expressed by formula (I) and a structural unit having a group expressed by formula (II); a resin (A) having an acid labile group and shows increase in the solubility with an alkali aqueous solution by an action of an acid; and an acid generator (B). The content of the resin (E) is 5 pts.mass or more and 30 mass% or less per 100 pts.mass of the resin (A). In formula (I), Rrepresents a 1-6C alkyl group including a fluorine atom. In formula (II), Z1represents an organic cation. |
