发明名称 半導体装置、電子装置、半導体装置の製造方法
摘要 A semiconductor device, includes: a connection member including a first pad formed on a principal surface thereof; a semiconductor chip including a circuit-formed surface on which a second pad is formed, the chip mounted on the connection member so that the circuit-formed surface faces the principal surface; and a solder bump that connects the first and second pads and is made of metal containing Bi and Sn, wherein the bump includes a first interface-layer formed adjacent to the second pad, a second interface-layer formed adjacent to the first pad, a first intermediate region formed adjacent to either one of the interface-layers, and a second intermediate region formed adjacent to the other one of the interface-layers and formed adjacent to the first intermediate region; Bi-concentration in the first intermediate region is higher than a Sn-concentration; and a Sn-concentration in the second intermediate region is higher than a Bi-concentration.
申请公布号 JP6028449(B2) 申请公布日期 2016.11.16
申请号 JP20120178509 申请日期 2012.08.10
申请人 富士通株式会社 发明人 清水 浩三;作山 誠樹;赤松 俊也
分类号 H01L21/60 主分类号 H01L21/60
代理机构 代理人
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