| 摘要 |
Provided is a Cu-based alloy for magnetic recording, which contains, in at%, (A) 1-23.4% of one or more elements selected from the group consisting of Cr, Mo and W, (B) 0-5% of one or more elements selected from the group consisting of Al, Si, Zn, Mn and Ni, and (C) 0-1% of one or more elements selected from the group consisting of Y, La, Ce, Nb, Sm, Gd, Tb and Dy, with the balance made up of Cu and unavoidable impurities. The alloy of the present invention has a high thermal conductivity and a high hardness at the same time, and is thus capable of providing a sputtering target that is suitable for the production of a thermally assisted magnetic recording medium and of providing a thermally assisted magnetic recording medium having a high impact resistance. |
