| 摘要 |
An objective of this invention is to provide a photoresist composition that fully satisfies basic properties such as sensitivity and has excellent MEEF, DOF and LWR. This photoresist composition contains [A] a polymer having an acid generating group and [B] an acid generating agent having at least one type of structure selected from the group consisting of lactone structures, cyclic carbonate structures, sultone structures, and alicyclic structures. Additionally, the acid generating agent [B] preferably has at least one type of structure selected from the group consisting of lactone structures and sultone structures. Moreover, the polymer [A] may comprise at least one type of structural unit selected from the group consisting of a structural unit (I) expressed by the formula (1) and a structural unit (II) expressed by the formula (2). |
